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Thermal ALD Equipment - List of Manufacturers, Suppliers, Companies and Products

Thermal ALD Equipment Product List

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Thermal ALD equipment "Savannah G2"

Thermal ALD equipment "Savannah G2"

For research and development, for small-scale batches! Standard equipped with a simple decontamination unit ALD Shield Vapor Trap.

The "Savannah G2" is a flexible thermal ALD device that is simple and easy to use, capable of supporting everything from research and development to small-scale mass production. It achieves high film deposition performance with a simple system, and configurations can be selected according to applications and budgets. Please feel free to contact us if you have any inquiries. 【Features】 ■ Achieves high film deposition performance with a simple system ■ Ultra-high aspect ratio (less than 2000:1) compatible mode ■ Configuration selection based on applications and budgets ■ Precursor lines: up to 6 lines ■ Simple exhaust unit: ALD Shield Vapor Trap standard equipped * For more details, please refer to the PDF materials or feel free to contact us.

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Plasma/Thermal ALD equipment 'Fiji G2'

Plasma/Thermal ALD equipment 'Fiji G2'

500℃ wafer stage! Adoption of a remote ICP source with no plasma damage.

The "Fiji G2" is a research and development ALD system that utilizes thermal and plasma methods. It employs an ICP remote plasma source and features a vacuum load lock for substrate transport, designed to produce high-quality ALD films of oxide, nitride, and metal layers. Additionally, it comes standard with a simple exhaust unit, the ALD Shield Vapor Trap, and can accommodate up to 6 plasma gas lines. 【Features】 ■ 500°C wafer stage ■ Remote ICP source with no plasma damage ■ Mode supporting ultra-high aspect ratios (<2000:1) (thermal) ■ Plasma gas lines: up to 6 lines ■ Precursor lines: up to 6 lines *For more details, please refer to the PDF document or feel free to contact us.

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Thermal ALD equipment "Phoenix G2"

Thermal ALD equipment "Phoenix G2"

Many safety measures specifications necessary for mass production! Compact device size with a film formation temperature of 50 to 285°C.

The "Phoenix G2" is a thermal ALD system suitable for medium-scale production. It features a reactor design proven to provide excellent process flexibility, making it easy to use for various applications. Additionally, it supports semi-auto loaders or vacuum load locks and has an appropriate chamber size (less than 370mm x 470mm). 【Features】 ■ Reactor design proven to provide excellent process flexibility ■ Easy to use for various applications ■ Many safety measures required for mass production ■ Compatible with semi-auto loaders or vacuum load locks ■ Appropriate chamber size: less than 370mm x 470mm *For more details, please refer to the PDF document or feel free to contact us.

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Thermal ALD equipment "Firebird"

Thermal ALD equipment "Firebird"

Top-class throughput! Flexible modular design.

The "Firebird" is a thermal ALD device of the cluster tool type for large-scale mass production. It is equipped with Veeco's proven automation system, ensuring batch transport with minimal impact on the substrates. Please feel free to consult us when you need assistance. 【Features】 ■ Top-class throughput ■ Low ownership cost ■ Proven Veeco automation system ■ Flexible modular design ■ Batch transport with minimal impact on substrates ■ Veeco's global sales, service, and support *For more details, please refer to the PDF document or feel free to contact us.

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